|Track||Date and time||Hall||Duration|
|Contributed Lectures||Tuesday, 16. June 2015., 14:30||Mimoza II Hall||20’|
Pedro Grande (1), Lucio Rosa (1), Johnny Dias (1), Raul Fadanelli (1), Maarten Vos (2)
(1) Ion Implantation Laboratory, Institute of Physics, Federal University of Rio Grande do Sul, Av. Bento Goncalves, 9500, CP 15051, CEP 91501-970, Porto Alegre, RS, Brazil
(2) Atomic and Molecular Physics Laboratory, Research School of Physics and Engineering, The Australian National University, Canberra, Australia 0200
The Coulomb explosion of small cluster beams can be used to measure the dwell time of fragments traversing amorphous films . Therefore, the thickness of thin films can be obtained with the so-called Coulomb depth profiling technique using relatively high cluster energies where the fragments are fully ionized after breakup. Here we demonstrate the applicability of Coulomb depth profiling technique at lower cluster energies where neutralization and wake effects come into play. To that end, we investigated 50-200 keV/u H2+ molecular ions impinging on a 10 nm TiO2 film and measured the energy of the backscattered H+ fragments with high-energy resolution. The effect of the neutralization of the H+ fragments along the incoming trajectory before the backscattering collision is clearly observed at lower energies through the decrease of the energy broadening due to the Coulomb explosion. The reduced values of the Coulomb explosion combined with full Monte-Carlo simulations provide compatible results with those obtained at higher cluster energies where neutralization is less important. The results are corroborated by electron microscopy measurements.
 S. Shubeita, R. Fadanelli, J. Dias, and P. Grande, Surface Science 608, 292 (2013).
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